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Single Substrate Clean Oven

Single Substrate Clean Oven

Product Details:

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Product Description

To enlarge equipment many improvements such as mechanism to prevent fume in.

Oven a measures for time reduction at temperature rise and fall, shortening of maintenance time and etc have been added.

System that includes Loader, Unloader, multiple chambers and cooling system by robot is available. (Robot teaching is included)                                 

IR oven is also available.

Specifications : 

Clean level class 100 inside oven

Application : Seal cure, color filter, Touch panel, Array process, and others

Size : G2-G6  (-G8 with subcontructor) *200x200-2000x2000 mm 

  • Mechanism to prevent fume in oven
  • Uniform temperature distribution
  • Clean level in oven : under Class 100
  • Mechanism to prevent substrate to slide in oven
  • Measures for time reduction temperature rise and fall
  • Shuttle system for Cooling unit
  • Mura preventive rack support
  • Various Communication including SECS, HSMS (CIM) 

Note: Monthly Production Capacity: 2 depending on size and specification *standard delivery time : 4 months

Actual sizes made : Length x Width : Max 3,400 x 3,000 – Min 20 x 20

Thickness is independent on length and width. 

 High performance

 

  • Max. conveyor speed : about 20m/min
  • Standard cleaning level: under 10μ in particle size
  • Applicable for precision cleaning)
Characteristics of ICM cleaner

More than 60 years experience beginning with FPD brush cleaner
  • Wide range of application, mainly for LCD processes, Mother glasses, OLED, Automobile curved Glasses, Solar Panels, Optical glasses and etc.
  • Various types of Cleaning methods for best performance and efficiency including contact and non-contact cleaning.
  • Substrate size developed for MIN 20 x 20 mm – MAX 3,400 x 3,000

 

 

 


ICM CO., LTD.

* Tips on getting accurate quotes. Please include product name, order quantity, usage, special requests if any in your inquiry.

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